The silicon carbide wafer boat is engineered to provide durable and stable support for semiconductor wafers during high-temperature processing steps such as diffusion, annealing, and chemical vapor deposition. Constructed from high-purity silicon carbide, it combines exceptional thermal shock resistance with outstanding chemical inertness, making it ideal for harsh furnace environments.

This wafer boat ensures minimal contamination and deformation, maintaining precise wafer spacing and uniform gas flow, which are critical for achieving consistent device performance and high yields. Its robust design withstands prolonged exposure to aggressive gases and elevated temperatures up to 1600°C, extending service life and reducing maintenance intervals.